Ultra Thin Coatings

Atomic layer deposition is a technique used to deposit chemicals in layers that are only one nanometer thick. It’s widely used in the manufacturing of computer chips, displays and other electronics, but requires the application of heat in order to catalyze the required reactions. Now researchers have found a way to use light instead of heat, a breakthrough that will expand the applications for these ultra-thin films.

One potential benefit of using ultra-violet light is the ability to cover larger surfaces, such as solar panels. Since the process is also more energy efficient, processes can employ higher performing materials without increasing cost. And the ability to apply the technique at lower temperatures opens up other new possibilities, including the use of atomic layer deposition in food packaging.

The researchers are beginning an 18-month feasibility study to further develop the concept for these and other high-tech manufacturing applications.